Electron beam lithography is a technique used to write nanometer-size features using a narrow beam o
Electron beam lithography is a technique used to write nanometer-size features using a narrow beam of electrons to trace out the desired pattern on your sample. This is a form of maskless lithography - custom patterns can be written without the need for a mask. However, ebeam lithography has a low throughput and it is expensive, making it impractical for industrial purposes. This form of lithography is mainly used in research, mask writing, and prototyping, rather than for mass producing devices. In the past, I have used this system to make nanowires that are less than 100 nm wide. This is 1/1000th the diameter of a human hair! -- source link
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